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SU-8: A photoresist for high-aspect-ratio and 3D submicron lithography

SU-8: A photoresist for high-aspect-ratio and 3D submicron lithography
Autor:

A. del Campo, C. Greiner

Quelle:

Journal of Micromechanics and Microengineering, 17(6), R81-R95 (2007)