The department Composites and Thin Films uses different PVD coating facilities for thin film development, particularly magnetron sputtering, arc ionplating and CVD/PVD hybride processes. The thin film characterization will be carried out concerning microstructure, properties and behaviour. By means of a lithographic process films can be micropatterned.
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Coating facilities:
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Coating facility HTC 625 |
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Hybrid coating facility |
Multifunctional PVD coating facility Sulzer Metaplas MZR 303 RF: DC-/HF-Magnetron-Sputtering & arc melting |
Characterisation Methods:
Structure and composition:
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Properties:
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