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Equipment

The department Composites and Thin Films uses different PVD coating facilities for thin film development, particularly magnetron sputtering, arc ionplating and CVD/PVD hybride processes. The thin film characterization will be carried out concerning microstructure, properties and behaviour. By means of a lithographic process films can be micropatterned.

Coating facilities:

  • Leybold Z550
  • Hauzer HTC 625
  • Metaplas MZR 303
  • Hybrid


Micropattering:

  • Lithographie
  • RIE
  • Plasmastrahlätzen

 

 

Coating facility HTC 625

 

Hybrid coating facility

 

Multifunctional PVD coating facility Sulzer Metaplas MZR 303 RF: DC-/HF-Magnetron-Sputtering & arc melting


Characterisation Methods:

  Structure and composition:
  • EPMA 
  • GDOS
  • Raman spectroscopy
  • 3 x Diffraktometer für XRD/XRR
  • Profilometry
  • Calotest
Properties:
  • Vibrating Sample Magnetometer (VSM)
  • HF-Permeameter
  • MOKE
  • AFM/MFM
  • Galvanostatic charakterisation
  • Cyclic voltammetry
  • Nanoindentor
  • Microhardness
  • Scratchtest
  • Pin-on-Disk Tribometer